Multiperiodic magnetoplasmonic gratings fabricated by the pulse force nanolithography

We propose a novel technique for the magnetoplasmonic nanostructures fabrication based on pulse force nanolithography method. It allows one to create high-quality that have lower total losses than gratings made by electron beam lithography. The method provides control of SPP excitation efficiency varying grating parameters such as scratching depth or number scratches in single period. quality plasmonic was estimated means transverse magneto-optical Kerr effect is extremely sensitive finesse structure.